Projection exposure apparatus and device manufacturing method that change a resonator length of a continuous emission excimer laser
US6853442B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 8, 2001 |
| Grant date | Feb 8, 2005 |
| Priority date | — |
| Expiry date | Jan 19, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70958
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A projection exposure apparatus includes a continuous emission excimer laser for providing laser light having a predetermined wavelength, an illumination optical system for illuminating a pattern of a reticle with laser light having the predetermined wavelength, a projection optical system for projecting the illuminated pattern of the reticle onto a substrate, wherein the projection optical system is provided by a lens system made of a substantially single glass material, a laser for injecting light having the predetermined wavelength into a resonator of the continuous emission excimer laser, a wavemeter for measuring the wavelength of the laser light from the continuous emission excimer laser, and a changing device for changing a resonator length of the continuous emission excimer laser on the basis of a signal from the wavemeter so that the wavelength of the laser light from the continuous emission excimer laser becomes equal to the predetermined wavelength.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.