Planarizing antireflective coating compositions
US6855466B2 · kind B2 · utility
15Cited by
37References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 15, 2001 |
| Grant date | Feb 15, 2005 |
| Priority date | — |
| Expiry date | Sep 15, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/151
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides new light absorbing compositions suitable for use as antireflective coating compositions (“ARCs”), including for deep UV applications. The antireflective compositions of the invention are particularly useful where a planarizing coating layer is required. ARCs of the invention contain a low molecular weight resin, a plasticizer compound and/or a low Tg resin. The invention also includes methods for applying forming planarizing ARC coating layers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.