Reflectometer arrangement and method for determining the reflectance of selected measurement locations of measurement objects reflecting in a spectrally dependent manner

US6856395B2 · kind B2 · utility

Assignees

• AIXUV GmbH · DE
• JENOPTIK Mikrotechnik GmbH · DE
• Schott Glas · DE

Inventors

• Rainer Lebert · Kelmis, BE
• Ulf Heim · Ilmenau, DE
• Lutz Aschke · Mainz, DE
• Larissa Juschkin · Bochum, DE

Key dates

• Filing date: Apr 11, 2002
• Grant date: Feb 15, 2005
• Expiry date: Aug 7, 2023

Classification

• Technology area (CPC G): Physics
• CPC primary: G01N21/55
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

In a reflectometer arrangement and a method for determining the reflectance of selected measurement locations on measurement objects reflecting in a spectrally dependent manner, the object of the invention is to reduce the time for measuring a measurement object with a robust and simple measurement structure to such an extent that compact radiation sources with low output compared to a synchrotron can be used at the site of production or of use of the measurement object to characterize the object characteristics in a manner suited to series production. A measurement beam bundle proceeding from a polychromatically emitting radiation source is directed onto the measurement location of the measurement object sequentially in modified manner by impressing spectral reference reflection characteristics and the radiation reflected from every measurement location is detected integrally. The arrangement and the method can be used with surfaces which reflect in a spectrally dependent manner and which are designed particularly for radiation in the extreme ultraviolet range.