Method and apparatus for treating substrates

US6858088B1 · kind B1 · utility

Assignee

• Steag Hamatech AG · US

Inventors

• Peter Dress · Bruchsal, DE
• Karl Appich · Maulbronn, DE
• Peter Krauss · Lindau (Bodensee), DE
• Jakob Szekeresch · Westerburg, DE
• Robert Weihing · Heuchelheim, DE

Key dates

• Filing date: Jan 19, 2000
• Grant date: Feb 22, 2005
• Expiry date: Jan 19, 2020

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/162
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

To achieve a uniform coating of a substrate, with an apparatus and a method for coating substrates, according to which the substrate is supported on a substrate holder in such a way that a substrate surface that is to be coated is exposed, and the substrate is rotated together with the substrate holder, a cover can be secured to the substrate holder and together with the substrate holder forms a sealed chamber for the substrate.