Process depending on plasma discharges sustained by inductive coupling
US6858112B2 · kind B2 · utility
24Cited by
18References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 18, 1996 |
| Grant date | Feb 22, 2005 |
| Priority date | — |
| Expiry date | Mar 19, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/46
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A process for fabricating a product 28, 119. The process comprises the steps of subjecting a substrate to a composition of entities, at least one of the entities emanating from a species generated by a gaseous discharge excited by a high frequency field in which the vector sum of currents to phase and inverse-phase capacitive coupled voltages from the inductive coupling structure can be selectively maintained.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.