Lithography exposure device

US6859261B2 · kind B2 · utility

Assignee

• KLEO Halbleitertechnik GmbH & Co KG · DE

Inventors

• Hans Opower · Krailling, DE
• Stefan Scharl · Günzburg, DE

Key dates

• Filing date: Dec 6, 2002
• Grant date: Feb 22, 2005
• Expiry date: Dec 31, 2022

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/704
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A lithography exposure device for producing exposed structures in a layer sensitive to light includes an exposure unit with a movement unit for the relative movement between the optical focusing element and a mounting device. A controler is provided for controlling intensity and position of the exposure spots, such that a plurality of conversion areas can be produced in the light-sensitive layer via the exposure spots. A controllable deflection device is provided between the laser radiation sources and the optical focusing means for the movement of the exposure spot in the deflection direction.