Stefan Scharl
6Patents
3h-index
2Co-inventors
39Inventor score
Filing activity: Dec 6, 2002 → Aug 21, 2008
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7019818B2 | Apparatus for exposing substrate materials | Physics | 7 | Expired |
| US7705967B2 | Exposure system | Physics | 4 | Active |
| US7652750B2 | Lithography exposure device having a plurality of radiation sources | Physics | 3 | Expired |
| US6859261B2 | Lithography exposure device | Physics | 2 | Expired |
| US8027018B2 | Method and device for producing exposed structures | Physics | 2 | Active |
| US8248581B2 | Exposure system | Physics | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.