Reflection type projection optical system, exposure apparatus and device fabrication method using the same
US6860610B2 · kind B2 · utility
4Cited by
8References
19Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 6, 2003 |
| Grant date | Mar 1, 2005 |
| Priority date | — |
| Expiry date | Feb 6, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70275
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A reflection type projection optical system for projecting a pattern on an object surface onto an image surface and forming an imaging system that forms an intermediate image between the object surface and image surface includes four or more mirrors arranged substantially as a coaxial system to reflect light from an object side to an image side, reflection surfaces on the four or more mirrors forming the same direction for forming a reflection angle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.