Patent · US Expired

Window portion with an adjusted rate of wear

US6860793B2 · kind B2 · utility

37Cited by

11References

13Claims

0Family size

Assignee

Rohm and Haas Electronic Materials CMP Holdings, Inc. · US

Inventors

William D. Budinger · Chadds Ford, US
Naoto Kubo · Nara, JP

Key dates

Filing date	Mar 13, 2001
Grant date	Mar 1, 2005
Priority date	—
Expiry date	Mar 13, 2021

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB24B49/12
WIPO fieldMachine tools
WIPO sectorMechanical engineering

Abstract

A polishing pad includes a polishing layer, and the transparent window portion of the polishing layer having dispersed particles to increase the rate at which the window portion wears away during a polishing operation, and to avoid forming a lump in the polishing layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.