Method for manufacturing a workpiece using a magnetron sputter source
US6860977B2 · kind B2 · utility
8Cited by
4References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 6, 2003 |
| Grant date | Mar 1, 2005 |
| Priority date | — |
| Expiry date | Nov 6, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3408
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A workpiece is manufactured using a magnetron source that has an optimized yield of sputtered-off material as well as service life of the target. Good distribution values of the layer on the workpiece are obtained that are stable over the entire target service life, and a concave sputter face in a configuration with small target-to-workpiece distance is combined with a magnet system to form the magnetron electron trap in which the outer pole of the magnetron electron trap is stationary and an eccentrically disposed inner pole with a second outer pole part is rotatable about the central source axis.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.