Stanislav Kadlec
18Patents
5h-index
20Co-inventors
66Inventor score
Filing activity: Apr 16, 1992 → Sep 15, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5234560A | Method and device for sputtering of films | Electricity | 68 | Expired |
| US8574409B2 | Method of magnetron sputtering and a method for determining a power modulation compensation function for a power supply applied to a magnetron sputtering source | Electricity | 14 | Active |
| US9355824B2 | Arc suppression and pulsing in high power impulse magnetron sputtering (HIPIMS) | Electricity | 12 | Active |
| US9587306B2 | Method for producing a directional layer by cathode sputtering, and device for implementing the method | Electricity | 11 | Active |
| US6860977B2 | Method for manufacturing a workpiece using a magnetron sputter source | Electricity | 8 | Expired |
| US6682637B2 | Magnetron sputter source | Electricity | 4 | Expired |
| US7138343B2 | Method of producing a substrate with a surface treated by a vacuum treatment process, use of said method for the production of coated workpieces and plasma treatment chamber | Chemistry; Metallurgy | 4 | Expired |
| US7718042B2 | Method for manufacturing sputter-coated substrates, magnetron source and sputtering chamber with such source | Electricity | 2 | Active |
| US9611537B2 | Target shaping | Electricity | 2 | Active |
| US8435389B2 | RF substrate bias with high power impulse magnetron sputtering (HIPIMS) | Electricity | 2 | Active |
| US10784092B2 | Reactive sputtering with HIPIMs | Electricity | 1 | Active |
| US8246794B2 | Method of magnetron sputtering and a method for determining a power modulation compensation function for a power supply applied to a magnetron sputtering source | Electricity | 1 | Active |
| US10692707B2 | RF substrate bias with high power impulse magnetron sputtering (HIPIMS) | Electricity | 1 | Active |
| US8475634B2 | Application of HIPIMS to through silicon via metallization in three-dimensional wafer packaging | Electricity | 0 | Active |
| US11380530B2 | Reactive sputtering with HIPIMS | Electricity | 0 | Active |
| US11842871B2 | Low voltage MEMS relay filled with alternative gas mixture to SF6 | Electricity | 0 | Active |
| US11211234B2 | Arc suppression and pulsing in high power impulse magnetron sputtering (HIPIMS) | Electricity | 0 | Active |
| US7429543B2 | Method for the production of a substrate | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.