Ink jet recording medium comprising amine-treated silica
US6861115B2 · kind B2 · utility
6Cited by
35References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 18, 2001 |
| Grant date | Mar 1, 2005 |
| Priority date | — |
| Expiry date | May 27, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24802
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
This invention pertains to an ink jet recording medium comprises a flexible substrate and a coating composition coated on at least one surface of the substrate, wherein the coating composition comprises the product formed from the contact between fumed silica particles and at least one aminoorganosiloxane. The invention also pertains to a method for the preparation of such an ink jet recording medium and to methods for the preparation of a coating composition and a dispersion useful in the preparation of such an ink jet recording medium.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.