Deep ultraviolet unit-magnification projection optical system and projection exposure apparatus
US6863403B2 · kind B2 · utility
30Cited by
14References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 27, 2003 |
| Grant date | Mar 8, 2005 |
| Priority date | — |
| Expiry date | Jun 22, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70225
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A 1X projection optical system for deep ultra-violet (DUV) photolithography is disclosed. The optical system is a modified Dyson system capable of imaging a relatively large field at high numerical apertures at DUV wavelengths. The optical system includes a lens group having first and second prisms and four lenses having a positive-negative-positive negative arrangement as arranged in order from the prisms toward the mirror. A projection photolithography system that employs the projection optical system of the invention is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.