Patent assignee · US · COMPANY

Ultratech

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136Patents
105Active
136Granted
55Portfolio score

Filing activity: Mar 27, 2000 → Nov 22, 2021 · 28 expiring within 5 years

Most-cited patents

PatentTitleAreaCited byStatus
US9929011B2 Formation of heteroepitaxial layers with rapid thermal processing to remove lattice dislocations Performing Operations; Transporting 447 Active
US7154066B2 Laser scanning apparatus and methods for thermal processing Performing Operations; Transporting 62 Expired
US7098155B2 Laser thermal annealing of lightly doped silicon substrates Performing Operations; Transporting 36 Expired
US8067305B2 Electrically conductive structure on a semiconductor substrate formed from printing Electricity 32 Active
US7763828B2 Laser thermal processing with laser diode radiation Performing Operations; Transporting 31 Expired
US6863403B2 Deep ultraviolet unit-magnification projection optical system and projection exposure apparatus Physics 30 Expired
US6879383B2 Large-field unit-magnification projection system Physics 28 Expired
US6813098B2 Variable numerical aperture large-field unit-magnification projection system Physics 28 Expired
US8014427B1 Line imaging systems and methods for laser annealing Electricity 22 Active
US6825101B1 Methods for annealing a substrate and article produced by such methods Electricity 20 Expired
US7148159B2 Laser thermal annealing of lightly doped silicon substrates Performing Operations; Transporting 19 Expired
US7157660B2 Laser scanning apparatus and methods for thermal processing Electricity 18 Expired
US7482254B2 Apparatus and methods for thermally processing undoped and lightly doped substrates without pre-heating Electricity 17 Active
US7744274B1 Methods and apparatus for temperature measurement and control on a remote substrate surface Physics 17 Active
US7494942B2 Laser thermal annealing of lightly doped silicon substrates Performing Operations; Transporting 17 Active
US7847213B1 Method and apparatus for modifying an intensity profile of a coherent photonic beam Performing Operations; Transporting 16 Active
US7514305B1 Apparatus and methods for improving the intensity profile of a beam image used to process a substrate Electricity 16 Active
US8309474B1 Ultrafast laser annealing with reduced pattern density effects in integrated circuit fabrication Electricity 16 Active
US7145104B2 Silicon layer for uniformizing temperature during photo-annealing Electricity 15 Expired
US7433051B2 Determination of lithography misalignment based on curvature and stress mapping data of substrates Electricity 15 Active
US7253376B2 Methods and apparatus for truncating an image formed with coherent radiation Performing Operations; Transporting 14 Expired
US6844250B1 Method and system for laser thermal processing of semiconductor devices Electricity 14 Expired
US7399945B2 Method of thermal processing a substrate with direct and redirected reflected radiation Performing Operations; Transporting 13 Active
US6898306B1 Machine-independent alignment system and method Physics 12 Expired
US10316406B2 Methods of forming an ALD-inhibiting layer using a self-assembled monolayer Electricity 12 Active

Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.