System and method to control radial delta temperature
US6864466B2 · kind B2 · utility
2Cited by
16References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 8, 2002 |
| Grant date | Mar 8, 2005 |
| Priority date | — |
| Expiry date | Mar 8, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67109
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A system and method of minimizing stress related to the ramp rate of a variable by limiting the ramp rate as a function of the current value of the variable is provided. More specifically, the present invention provides a system and method of maintaining the radial delta temperature of a semiconductor substrate or other heated body below the crystal slip curve by dynamically controlling the temperature ramp rate during processing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.