Droplet and filament target stabilizer for EUV source nozzles
US6864497B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 11, 2002 |
| Grant date | Mar 8, 2005 |
| Priority date | — |
| Expiry date | Apr 11, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70033
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
An EUV radiation source that creates a stable solid target filament. The source includes a nozzle assembly having a condenser chamber for cryogenically cooling a gaseous target material into a liquid state. The liquid target material is forced through an orifice of a target filament generator into an evaporation chamber as a liquid target stream. The evaporation chamber has a higher pressure than a vacuum process chamber of the source to allow the liquid target material to freeze into a target filament in a stable manner. The frozen target filament is emitted from the evaporation chamber into the process chamber as a stable target filament towards a target area. The higher pressure in the evaporation chamber can be the result of the evaporative cooling of the target material alone or in combination with a supplemental gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.