Electron optical system array, method of fabricating the same, charged-particle beam exposure apparatus, and device manufacturing method
US6872950B2 · kind B2 · utility
38Cited by
59References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 29, 2001 |
| Grant date | Mar 29, 2005 |
| Priority date | — |
| Expiry date | Feb 19, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/1205
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
This invention relates to an electron optical system array having a plurality of electron lenses. The electron optical system array includes a plurality of electrodes arranged along the paths of a plurality of charged-particle beams. Each of the plurality of electrodes has a membrane in which a plurality of apertures are formed on the paths of the plurality of charged-particle beams, and a support portion which supports the membrane. At least two of the plurality of electrodes are arranged to form a nested structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.