Electron optical system array, charged-particle beam exposure apparatus using the same, and device manufacturing method
US6872951B2 · kind B2 · utility
9Cited by
53References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 29, 2001 |
| Grant date | Mar 29, 2005 |
| Priority date | — |
| Expiry date | Jan 9, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/1205
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron optical system array has a plurality of electron lenses, the system array having at least two electrodes structures which respectively have membranes and are arranged along an optical axis, each of the membranes having a plurality of apertures through which charged-particle beams pass. There is also a spacer which is interposed between the facing membranes and adjacent to the aperture and which determines a gap between the facing membranes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.