Electron optical system array, method of manufacturing the same, charged-particle beam exposure apparatus, and device manufacturing method
US6872952B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 29, 2001 |
| Grant date | Mar 29, 2005 |
| Priority date | — |
| Expiry date | Jan 9, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K1/087
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
This invention relates to an electron optical system array having a plurality of electron lenses. The electron optical system array includes a plurality of electrode structures which are arranged along the paths of a plurality of charged-particle beams and have pluralities of apertures on the paths of the plurality of charged-particle beams. At least one of the plurality of electrode structures includes a substrate having a plurality of apertures for transmitting the plurality of charged-particle beams, and a plurality of electrodes extending from the side surfaces of the plurality of apertures to the peripheries of the plurality of apertures. At least the surface of the substrate is insulated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.