High flow rate bubbler system and method
US6874770B2 · kind B2 · utility
8Cited by
15References
19Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 27, 2002 |
| Grant date | Apr 5, 2005 |
| Priority date | — |
| Expiry date | Dec 21, 2022 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01F23/12
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A high flow rate bubbler system and method are provided for producing a stable, easily controllable source of chemical vapors to a downstream process. The bubbler system is equipped with a vaporizer unit connected to its gas outlet tube. This vaporizer unit slows the gas velocity to enhance settling of entrained droplets and contacts the exiting gas with a high thermal mass, heated surfaces to promote heat transfer and evaporation of the entrained droplets.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.