Method for coating internal surface of plasma processing chamber
US6875477B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 3, 2003 |
| Grant date | Apr 5, 2005 |
| Priority date | — |
| Expiry date | Mar 3, 2023 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C4/11
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention comprises an aluminum base material 2 constituting the plasma processing chamber of the plasma processing apparatus, a bonding layer 3 deposited on the base material consisting of a transition metal or transition metal alloy that modifies the difference in thermal expansion coefficient of the base material and the material constituting a plasma contact surface, and the plasma contact surface 1 formed of a material selected from a group consisting of La2O3, LaAlO3, MgLaAl11O19, and a mixture of La2O3 and Al2O3 being a metal oxide including at least La and O deposited on the bonding layer 3 via a thermal spray process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.