Alignment method and apparatus therefor
US6876946B2 · kind B2 · utility
44Cited by
39References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 20, 2002 |
| Grant date | Apr 5, 2005 |
| Priority date | — |
| Expiry date | Nov 20, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7003
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of transferring a pattern of a mask onto shot areas on a substrate determines two sets of parameters in a single model equation. The parameters in one of the two sets relate to arrangement of a plurality of shot areas on the substrate, and the parameters in the other set relate to the shot areas per se. The mask and the substrate are moved relatively in accordance with the determined parameters.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.