Polymer, chemically amplified resist composition and patterning process
US6878501B2 · kind B2 · utility
18Cited by
13References
29Claims
0Family size
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Key dates
| Filing date | Apr 26, 2001 |
| Grant date | Apr 12, 2005 |
| Priority date | — |
| Expiry date | Dec 5, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Polymers comprising recurring units of cycloolefin having fluorinated alkyl introduced therein are novel and have transparency and alkali solubility. Using the polymers, resist compositions featuring low absorption of F2 excimer laser light are obtained.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.