Patent · US Expired

Reticle sorter

US6878895B1 · kind B1 · utility

0Cited by
7References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 26, 1999
Grant dateApr 12, 2005
Priority date
Expiry dateAug 26, 2019

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S209/939
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A reticle sorter and a semiconductor fabrication facility employing one or more reticle sorters is provided. The reticle sorter(s) generally lies between a reticle storage system and a group of one or more photolithography exposure tools (e.g., steppers) and is configured for sorting reticles in one or more cassettes. The use of the reticle sorter provides sorting functionality apart from the reticle storage system and typically closer to the group of photolithography steppers with which it is associated. This can, for example, significantly increase the throughput of semiconductor wafers through the associated photolithography exposure tools as well as in the semiconductor fabrication plant as a whole.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.