Patent · US Expired

Lithographic apparatus and device manufacturing method

US6879377B2 · kind B2 · utility

7Cited by
5References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 27, 2002
Grant dateApr 12, 2005
Priority date
Expiry dateMar 9, 2023

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/70991
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A lithographic projection apparatus includes a conduit that supplies utilities to a movable component in a vacuum chamber such as an object table, associated motor or sensor. The conduit comprises flexible metal bellows preventing out-gassing of the conduit due to the vacuum in the vacuum chamber while allowing movement of the movable component in at least a first degree of freedom.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.