Large-field unit-magnification projection system
US6879383B2 · kind B2 · utility
28Cited by
12References
21Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 27, 2002 |
| Grant date | Apr 12, 2005 |
| Priority date | — |
| Expiry date | Dec 27, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70225
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical system for projection photolithography is disclosed. The optical system is a modified Dyson system capable of imaging a large field over a broad spectral range. The optical system includes a positive lens group having three elements: a plano-convex element and two negative meniscus elements. The lens group is arranged adjacent to but spaced apart from a concave mirror along the mirror axis. A projection photolithography system that employs the optical system is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.