Metrology process for enhancing image contrast
US6881955B2 · kind B2 · utility
4Cited by
9References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 26, 2003 |
| Grant date | Apr 19, 2005 |
| Priority date | — |
| Expiry date | Aug 13, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N23/22
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A metrology process for increasing image contrast of a buried feature, comprising milling a selected surface of a substrate to expose a cross section of the buried feature; exposing the exposed cross section with a gas mixture, wherein the gas mixture comprises a flourine bearing compound; and irradiating the exposed cross section with a high energy beam to increase image contrast of the buried feature.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.