Wei Lu
12Patents
4h-index
11Co-inventors
57Inventor score
Filing activity: Dec 4, 1998 → Oct 7, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7180061B2 | Method for electron beam-initiated coating for application of transmission electron microscopy | Physics | 7 | Expired |
| US10210606B2 | Signal response metrology for image based and scatterometry overlay measurements | Electricity | 6 | Active |
| US6683305B1 | Method to obtain transparent image of resist contact hole or feature by SEM without deforming the feature by ion beam | Physics | 5 | Expired |
| US6881955B2 | Metrology process for enhancing image contrast | Physics | 4 | Expired |
| US10365225B1 | Multi-location metrology | Physics | 4 | Active |
| US11520321B2 | Measurement recipe optimization based on probabilistic domain knowledge and physical realization | Physics | 2 | Active |
| US10139352B2 | Measurement of small box size targets | Physics | 2 | Active |
| US11313809B1 | Process control metrology | Electricity | 2 | Active |
| US6456450B1 | Method and apparatus for reducing track misregistration due to digital-to-analog converter quantization noise | Physics | 1 | Expired |
| US7094616B2 | High resolution cross-sectioning of polysilicon features with a dual beam tool | Physics | 1 | Expired |
| US10732516B2 | Process robust overlay metrology based on optical scatterometry | Physics | 0 | Active |
| US7997002B2 | Dual carbon nanotubes for critical dimension metrology on high aspect ratio semiconductor wafer patterns | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.