Patent · US Expired

EUV LITHOGRAPHIC PROJECTION APPARATUS COMPRISING AN OPTICAL ELEMENT WITH A SELF-ASSEMBLED MONOLAYER, OPTICAL ELEMENT WITH A SELF-ASSEMBLED MONOLAYER, METHOD OF APPLYING A SELF-ASSEMBLED MONOLAYER, DEVICE MANUFACTURING METHOD AND DEVICE MANUFACTURED THEREBY

US6882406B2 · kind B2 · utility

15Cited by
3References
15Claims
0Family size

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Inventors

Key dates

Filing dateJun 12, 2003
Grant dateApr 19, 2005
Priority date—
Expiry dateJun 12, 2023

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/70958
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

An EUV lithographic apparatus contains an optical element, the surface of the optical element being modified to reduce the effects of reflectivity reduction by molecular contamination. The surface is modified such that it includes a self assembled monolayer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.