Independently controlled read and write head stripe height parameters in slider back end process
US6884148B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | May 26, 2004 |
| Grant date | Apr 26, 2005 |
| Priority date | — |
| Expiry date | Jun 15, 2024 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B37/30
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A lapping guide system and method for lapping a merged read/write head are disclosed. The resistance RRE of a first ELG near the sensor in the read head is correlated to the resistance RWE of a second ELG and to the width of a first optical lapping guide (OLG) near the neck region of the write head. As the lapping progresses, RWE and RRE increase and the OLG width along the lapping plane increases. Thus, an OLG width and a RWE corresponding to a target neck height or throat height and a RRE corresponding to a target stripe height are determined. A lapping plane is actively tilted to enable write head dimensions to be independently controlled on a per wafer or per row basis. The first OLG is a triangular feature with one side parallel to the lapping plane and the other two sides converging near the lapping plane.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.