Fluorinated polymers having ester groups and photoresists for microlithography

US6884564B2 · kind B2 · utility

Assignee

• E.I. DU PONT DE NEMOURS AND COMPANY · US

Inventors

• Andrew Edward Feiring · Wilmington, US
• Jerald Feldman · Wilmington, US
• Frank Leonard Schadt, III · Wilmington, US
• Gary N. Taylor · Bound Brook, US

Key dates

• Filing date: Oct 25, 2002
• Grant date: Apr 26, 2005
• Expiry date: Oct 25, 2022

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/111
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Fluorinated polymers, photoresists and associated processes for microlithography are described. These polymers and photoresists are comprised of esters derived from fluoroalcohol functional groups that simultaneously impart high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparency, particularly at short wavelengths, e.g., 157 nm, which makes them highly useful for lithography at these short wavelengths.