Plasma processing apparatus and method
US6885153B2 · kind B2 · utility
48Cited by
5References
23Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 26, 2003 |
| Grant date | Apr 26, 2005 |
| Priority date | — |
| Expiry date | Nov 26, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32935
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for determining the potential of a plasma in a processing chamber includes determining voltages of respective plasma engaging surfaces of at least two plasma generating electrodes disposed within the processing chamber and determining the plasma potential by comparing the determined voltages and equating the highest determined voltage to the plasma potential.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.