Optical error minimization in a semiconductor manufacturing apparatus
US6885436B1 · kind B1 · utility
4Cited by
5References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 13, 2002 |
| Grant date | Apr 26, 2005 |
| Priority date | — |
| Expiry date | Oct 10, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70983
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided are systems and methods for overcoming optical errors occurring from reticle and other hardware usage in a semiconductor fabrication apparatus. The systems and methods minimize optical errors, such as those resulting from gravitational sag on a reticle or mask, for a pattern being projected onto a wafer. The reduced errors allow larger reticles and masks to be used—while maintaining optical accuracy; and also improve optical budget management.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.