George E. Bailey
14Patents
4h-index
9Co-inventors
45Inventor score
Filing activity: May 4, 1998 → Jun 22, 2006
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6782525B2 | Wafer process critical dimension, alignment, and registration analysis simulation tool | Physics | 14 | Expired |
| US6934929B2 | Method for improving OPC modeling | Physics | 10 | Expired |
| US6102143A | Shaped polycrystalline cutter elements | Fixed Constructions | 7 | Expired |
| US6894762B1 | Dual source lithography for direct write application | Electricity | 6 | Expired |
| US6885436B1 | Optical error minimization in a semiconductor manufacturing apparatus | Physics | 4 | Expired |
| US7005217B2 | Chromeless phase shift mask | Physics | 3 | Expired |
| US6627466B1 | Method and apparatus for detecting backside contamination during fabrication of a semiconductor wafer | Electricity | 3 | Expired |
| US7381502B2 | Apparatus and method to improve the resolution of photolithography systems by improving the temperature stability of the reticle | Physics | 2 | Active |
| US7023530B1 | Dual source lithography for direct write application | Electricity | 2 | Expired |
| US7298458B2 | Optical error minimization in a semiconductor manufacturing apparatus | Physics | 1 | Active |
| US7098996B1 | Optical error minimization in a semiconductor manufacturing apparatus | Physics | 1 | Expired |
| US6764749B2 | Method to improve the resolution of a photolithography system by use of a coupling layer between the photo resist and the ARC | Emerging Cross-Sectional Technologies | 0 | Expired |
| US6943055B2 | Method and apparatus for detecting backside contamination during fabrication of a semiconductor wafer | Electricity | 0 | Expired |
| US6866970B2 | Apparatus and method to improve the resolution of photolithography systems by improving the temperature stability of the reticle | Physics | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.