Reactor configuration and method for producing it

US6887437B1 · kind B1 · utility

Assignee

• Infineon Technologies AG · DE

Inventors

• Volker Lehmann · Hersbruck, DE
• Stefan Ottow · Dresden, DE
• Reinhard Stengl · Stadtbergen, DE
• Hans Reisinger · Grünwald, DE
• Hermann Wendt · Grasbrunn, DE

Key dates

• Filing date: Nov 22, 2000
• Grant date: May 3, 2005
• Expiry date: Apr 17, 2023

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B01J2219/00862
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A reactor configuration contains a housing connected to a silicon wafer. The silicon wafer has pores extending from a first main area of the silicon wafer into an interior of the silicon wafer, preferably as far as a second main area of the silicon wafer. A catalyst layer at least partly covers the surface of the pores.