Polymer compound for a chemical amplification resist and a fabrication process of a semiconductor device using such a chemical amplification resist
US6887644B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 29, 1998 |
| Grant date | May 3, 2005 |
| Priority date | — |
| Expiry date | Dec 25, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A resist composition includes a polymer principal chain, a carboxyl group having a protective group and bonding to a side chain of the polymer main chain, and an additional acidic functional group having an acid-cleavable protective group and bonding to a side chain of the polymer main chain, wherein the carboxyl group has a lactone structure represented by a formula (wherein n is an integer of 1-4, and R represents any of a hydrogen atom, an alkyl group, an alkoxyl group and an alkoxycarbonyl group and connected to an arbitrary position of said lactone structure excluding a second position forming an ester bonding) as the protective group.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.