Lithographic apparatus, device manufacturing method, and device manufactured thereby
US6888151B2 · kind B2 · utility
0Cited by
5References
55Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 18, 2004 |
| Grant date | May 3, 2005 |
| Priority date | — |
| Expiry date | May 29, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7085
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus according to one embodiment of the invention includes an image sensing device configured and arranged to measure a pattern in a patterned beam of radiation. The image sensing device comprises a slab on which at least two sensors are formed. The sensors are sensitive to radiation of the beam and are arranged on a first side of the slab. A film that is non-transparent to radiation of the beam is provided at the first side over the sensors. The film includes a patterned segment above each sensor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.