Cleaning method for substrate treatment device and substrate treatment device
US6893964B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 5, 2002 |
| Grant date | May 17, 2005 |
| Priority date | — |
| Expiry date | Mar 11, 2022 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4405
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A cleaning gas that is obtained by vaporizing a carboxylic acid is supplied into a treatment chamber having an insulating substance adhering to the inside thereof, and the inside of the treatment chamber is evacuated. When the cleaning gas supplied into the treatment chamber comes in contact with the insulating substance adhering to an inside wall and a susceptor in the treatment chamber, the insulating substance is turned into a complex, so that the complex of the insulating substance is formed. The complex of the insulating substance is easily vaporized due to its high vapor pressure. The vaporized complex of the insulating substance is discharged out of the treatment chamber by the evacuation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.