System and method for maskless lithography using an array of sources and an array of focusing elements

US6894292B2 · kind B2 · utility

Assignee

• Massachusetts Institute of Technology · US

Inventors

• Dario Gil · Mount Kisco, US
• Rajesh Menon · Boston, US
• David J. Carter · Concord, US
• Henry I. Smith · Sudbury, US
• George Barbastathis · Boston, US

Key dates

• Filing date: Jul 28, 2003
• Grant date: May 17, 2005
• Expiry date: Jul 28, 2023

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70275
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A maskless lithography system is disclosed that includes an array of focusing elements, each of which focuses an energy beam from an array of sources into an array of focal spots in order to create a permanent pattern on an adjacent substrate.