X-ray reflectometry with small-angle scattering measurement
US6895075B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 12, 2003 |
| Grant date | May 17, 2005 |
| Priority date | — |
| Expiry date | Jul 24, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N23/20
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Apparatus for inspection of a sample includes a radiation source and an array of detector elements arranged to receive radiation from the surface due to irradiation of an area of the surface by the radiation source. The array has a first operative configuration for resolving the received radiation along a first axis perpendicular to the surface, and a second operative configuration for resolving the received radiation along a second axis parallel to the surface. A signal processor processes the signal from the detector array in the two configurations so as to determine a reflectance of the surface as a function of elevation angle relative to the surface and a scattering profile of the surface as a function of azimuthal angle in a plane of the surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.