Electromagnetic field superimposed lens and electron beam device using this electromagnetic field superimposed lens
US6897450B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 15, 2001 |
| Grant date | May 24, 2005 |
| Priority date | — |
| Expiry date | Apr 27, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/28
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A magnetic pole of a magnetic field type lens is divided into a first magnetic pole section that is at ground potential, and a second magnetic pole section facing a sample and to which a negative high voltage is applied, the first magnetic pole section and the second magnetic pole section 212 being electrically insulated from each other, and an electric field type bi-potential lens is made up of an electrode attached to the first magnetic pole section so as to surround an electron beam path. High resolution observation with small chromatic aberration factor Cs, Cc is made possible without forming a positive high voltage section inside an electron beam path of a lens barrel.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.