X-ray mask
US6898267B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 29, 2002 |
| Grant date | May 24, 2005 |
| Priority date | — |
| Expiry date | Dec 18, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/32
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In an x-ray absorber in accordance with the present invention, reduced transmittance of the x-ray absorber is suppressed while phase shift amount in the vicinity of π-radians is achieved. For this purpose, a material is used that has a high transmittance per film thickness and contains an element with a high phase shift amount and an element with a low transmittance, as a material composition that forms the x-ray absorber. In other words, the transmittance of the x-ray absorber is mainly determined by the element with a low transmittance, and phase shift falling short of π-radians is compensated with the element with a high transmittance and a high phase shift.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.