Dual wavelength method of determining a relative position of a substrate and a template
US6902853B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 11, 2004 |
| Grant date | Jun 7, 2005 |
| Priority date | — |
| Expiry date | May 11, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24802
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
The present invention includes a method of determining a relative position of a substrate and a template spaced-apart therefrom, the substrate having substrate alignment marks disposed thereon and the template having template alignment marks disposed thereon, the method including, impinging first and second fluxes of light upon the substrate and template alignment marks, with the substrate and template alignment marks being responsive to the first flux of light defining a first response, and being responsive to the second flux of light defining a second response differing from the first response; and processing the first and second responses to form a focused image of the substrate and template alignment marks on a common plane, with the focused image indicating the relative position of the substrate and the template.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.