Patent · US Expired

Semiconductor device separation using a patterned laser projection

US6902990B2 · kind B2 · utility

49Cited by
30References
27Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 2, 2002
Grant dateJun 7, 2005
Priority date
Expiry dateMay 14, 2022

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S438/94
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

A method for separating a semiconductor wafer into several thousand devices or dies by laser ablation. Semiconductor wafers are initially pre-processed to create multiple devices, such as blue LEDs, on the wafers. The wafers are then mounted with tape coated with a generally high level adhesive. The mounted wafer is then placed on a vacuum chuck (which is itself positioned on a computer controlled positioning table) to hold it in place during the cutting process. The cutting surface is then covered with a protective layer to prevent contamination from the effluent resulting from the actual cutting process. A laser beam is generated and passed through optical elements and masks to create a pattern, such as a line or multiple lines. The patterned laser projection is directed at the wafer at a substantially normal angle and applied to the wafer until at least a partial cut is achieved through it. A mechanical separation process completes the separation when only a partial cut is achieved by the patterned laser projection. The dies are then transferred to a grip ring for further processing.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.