Electron optical system, charged-particle beam exposure apparatus using the same, and device manufacturing method
US6903345B2 · kind B2 · utility
29Cited by
46References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 29, 2001 |
| Grant date | Jun 7, 2005 |
| Priority date | — |
| Expiry date | Apr 19, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31774
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron optical system has a plurality of electron lenses. The system includes a first electron optical system array having electrodes with a plurality of rectangular apertures, and a second electron optical system array having electrodes with a plurality of rectangular apertures. The first and second electron optical system arrays are arranged along an optical axis in which a long side of each aperture of the first electron optical system array is perpendicular to a long side of each aperture of the second electron optical system array.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.