Extreme ultraviolet transition oscillator
US6903354B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Feb 21, 2003 |
| Grant date | Jun 7, 2005 |
| Priority date | — |
| Expiry date | Feb 21, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/00
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
Systems and techniques to generate extreme ultraviolet (EUV) illumination. An EUV system includes first layers, and second layers interleaved with the first layers, where the first layers and the second layers have a thickness selected to produce coherent transition radiation in an extreme ultraviolet wavelength region when an electron beam passes through the first layers and the second layers. The first and second layers may be built using thin film deposition techniques and etching techniques. The first layers may include metal, such as molybdenum. The second layers may include a dielectric material and may define regions of vacuum between the first layers, including possibly multiple regions of vacuum per layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.