Alternating pulse dual-beam apparatus, methods and systems for voltage contrast behavior assessment of microcircuits
US6906538B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 30, 2003 |
| Grant date | Jun 14, 2005 |
| Priority date | — |
| Expiry date | Oct 16, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R31/307
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Voltage contrast-based apparatuses, methods and systems for detection of continuity are described for use in evaluation of conducting components of a microcircuit such as a silicon wafer-based semiconductor chip. Two beams are directed to two separate conducting, electrically floating components on the sample, and are timed and delivered to be alternating pulses. One lower energy beam elicits its target to emit secondary electrons that are detected by an electron detector to produce an image. A second high-energy beam creates a virtual ground at its target. Voltage contrast images indicate whether there is continuity between the two conducting components.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.