Micro-mechanical device having anti-stiction layer and method of manufacturing the device
US6906845B2 · kind B2 · utility
9Cited by
6References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 23, 2003 |
| Grant date | Jun 14, 2005 |
| Priority date | — |
| Expiry date | Dec 12, 2023 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2201/112
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
The micro-mechanical structure includes an anti-stiction layer formed by plasma enhanced chemical vapor deposition and plasma etching. The anti-stiction layer is selectively formed on only the area of a substrate other than the top of a movable structure and a part of an electrode that is subsequently bonded to a wire.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.