ATR-FTIR metal surface cleanliness monitoring
US6908773B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 19, 2002 |
| Grant date | Jun 21, 2005 |
| Priority date | — |
| Expiry date | Mar 24, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/3595
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Attenuated total reflectance (ATR)-Fourier transform infrared (FTIR) metal surface cleanliness monitoring is disclosed. A metal surface of a semiconductor die is impinged with an infrared (IR) beam, such as can be accomplished by using an ATR technique. The IR beam as reflected by the metal surface is measured. For instance, an interferogram of the reflected IR beam may be measured. A Fourier transform of the interferogram may also be performed, in accordance with an FTIR technique. To determine whether the metal surface is contaminated, the IR beam as reflected is compared to a reference sample. For example, the Fourier transform of the interferogram may be compared to the reference sample. If there is deviation by more than a threshold, the metal surface may be concluded as being contaminated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.