Method for imprint lithography using an electric field
US6908861B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 11, 2002 |
| Grant date | Jun 21, 2005 |
| Priority date | — |
| Expiry date | Feb 11, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/0271
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A lithography process for creating patterns in an activating light curable liquid using electric fields followed by curing of the activating light curable liquid is described. The process involves the use of a template that is formed of non-conductive and electrically conductive portions. The template is brought into close proximity to the activating light curable liquid on the substrate. An external electric field is applied to the template-substrate interface while maintaining a uniform, carefully controlled gap between the template and substrate. This causes the activating light curable liquid to be attracted to the raised portions of the template. Activating light is applied to the curable liquid while an electric field is applied to the template to create a patterned layer on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.